半導體廠情境
Key Features Reproduced:
🔬 Five Fab Systems: Alice (photoresist), Bob (plasma etch), Carlos (CVD), Diana (metrology), Elena (ion beam)
🏭 Three Chambers: Prep staging, transfer chamber, and active processing
⚙️ Process Control: Systems marked with ⚙️ can control transfers between chambers
🚫 Critical Constraints:
- Photoresist + CVD incompatible (contamination)
- Plasma + Metrology stay coupled (real-time feedback)
- Ion beam + CVD interference (sensor conflicts)
- 其他運用領域：機器人，供應鏈管理，自駕車，半導體廠製程，機器人人機協作安全規劃
- 這個題目對AI 為什麼有點難? 多個限制條件的複雜問題
- 推理模式是甚麼? 推理 vs. 直覺
沒有留言:
張貼留言